Hostname: page-component-78c5997874-t5tsf Total loading time: 0 Render date: 2024-11-19T05:11:38.356Z Has data issue: false hasContentIssue false
  • English
  • Français

Laser Induced Wet-Chemical Etching of Mn-Zn Ferrite in H3PO4

Published online by Cambridge University Press:  25 February 2011

Yong Feng Lu ,
Mikio Takai ,
Syohei Nagatomo  and
Susumu Namba
Yong Feng Lu
Affiliation:
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University, Toyonaka, Osaka 560, Japan
Mikio Takai
Affiliation:
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University, Toyonaka, Osaka 560, Japan
Syohei Nagatomo
Affiliation:
D.S. Scanner Co., Ltd., Izumimachi, Higashiku, Osaka 540, Japan
Susumu Namba
Affiliation:
Faculty of Engineering Science and Research Center for Extreme Materials, Osaka University, Toyonaka, Osaka 560, Japan
Get access

Abstract

Maskless etching of single crystalline Mn-Zn ferrite in an H3PO4 aqueous solution by Ar+ laser irradiation has been investigated to obtain high etching rates and aspect-ratios of etched grooves. The etching processes have been found to be photochemical in a low laser power region and thermochemical in a high laser power region. High etching rates of up to 340 pm/s and an aspect-ratio of 50 for slab structures have been achieved. Periodic ripple structures have been observed under specific etching conditions due to the local surface melting.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 129: Symposium B – Laser and Particle-Beam Modification of Chemical Processes on Surfaces , 1988 , 339
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Takai, M., Nagatomo, S., Koizumi, T., Lu, Y.F., Gamo, K., and Namba, S.: Laser Processing and Diagnostics (II), ed. by Bauerle, D., Kompa, K.L. and Lande, L. (Les Editions de Phys., Cedex, 1986) P.57 Google Scholar
2. Takai, M., Lu, Y.F., Koizumi, T., Nagatomo, S., and Namba, S.: Appl. Phys., A46, 197(1988)Google Scholar
3. Lu, Y.F., Takai, M., Nagatomo, S., and Namba, S.: Appl. Phys. A (in press)Google Scholar
4. Tsao, J.T. and Ehrlich, D.J.: Appl. Phys. Lett., 43, 146(1983)CrossRefGoogle Scholar
5. Eyett, M., Bauerle, D., Wersing, W., Lubitz, K., and Thomann, H.: Appl. Phys. A40, 235(1986)Google Scholar
6. Eyett, M., Bauerle, D., Wersing, W., and Thomann, H.: J. Appl. Phys., 62, 1511(1987)Google Scholar
7. Podlesnik, D.V., Gilgen, H.H., and Osgood, R.M. Jr., : Appl. Phys. Lett., 48, 496(1986)CrossRefGoogle Scholar
8. Crnone, C., Rothschild, M., and Ehrlich, D.J.: Appl. Phys. Lett., 48, 736(1986)Google Scholar