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Laser Chemical Etching of Conducting and Semiconducting Materials

Published online by Cambridge University Press:  15 February 2011

T. J. Chuang
T. J. Chuang*
Affiliation:
IBM Research Laboratory, 5600 Cottle Road, San Jose, California, USA
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Abstract

The purpose of the paper is to examine the basic processes involved in the laser-enhanced chemical etching of solids. Specifically, the process of chemisorption, the reaction between the adsorbate and substrate atoms and the vaporization of product species affected by the laser radiation are discussed. It is shown that the laser method can provide important insight into the gas-surface reaction mechanisms. In addition, a number of examples are given to demonstrate the potential of the technique for applications to material processing. Some current studies on the laser-induced chemical etching of materials relevant to microelectronics are reviewed. Certain practical experimental approaches are also considered.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 17: Symposium I – Laser Diagnostics and Photochemical Processing for Semiconductor Devices , 1982 , 45
Copyright
Copyright © Materials Research Society 1983

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References

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