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KrF Laser-Induced Chemical Etching of Nickel with Br2

Published online by Cambridge University Press:  25 February 2011

George W. Tyndall  and
Christopher R. Moylan
George W. Tyndall
Affiliation:
IBM Almaden Research Center, 650 Harry Rd., San Jose, CA 95120
Christopher R. Moylan
Affiliation:
IBM Almaden Research Center, 650 Harry Rd., San Jose, CA 95120
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Abstract

A quartz crystal microbalance (QCM) has been used to study the 248 nm laser-induced etching of nickel by Br2. The experiment consists of focusing a pulsed UV laser beam at normal incidence onto the surface of a quartz crystal coated with 1μm of polycrystalline nickel. Absolute etch rates of nickel, in terms of mass removed per unit time, are determined from the integrated sensitivity function of the 6Mhz crystals used in this work. The dependence of the etch rate on Br2 pressure and laser fluence was measured. The kinetic data obtained from these measurements show that the mechanism of the etching process is dominated by the formation and the subsequent removal of a NixBry monolayer.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 129: Symposium B – Laser and Particle-Beam Modification of Chemical Processes on Surfaces , 1988 , 327
Copyright
Copyright © Materials Research Society 1989

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References

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