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Kinetics of Ni Silicides Synthesis with Excimer Laser Pulses Studied by TRR

Published online by Cambridge University Press:  03 September 2012

R. Černý ,
P. PŘkryl ,
K.M.A. El-Kader ,
P. Engst ,
P. KubÁt  and
V. ChÁb
R. Černý
Affiliation:
Department of Physics, Faculty of Civil Engineering, Czech Technical University, Thátkurova 7, 166 29 Prague 6
P. PŘkryl
Affiliation:
Mathematical Institute, Czech Academy of Sciences, Zitnd 25, 115 67 Prague 1
K.M.A. El-Kader
Affiliation:
Institute of Physics, Czech Academy of Sciences, Cukrovarnickd. 10, 162 00 Prague 6
P. Engst
Affiliation:
The Heyrovský Institute of Physical Chemistry and Electrochemistry, Dolejškova 3, 182 23 Prgue 8
P. KubÁt
Affiliation:
The Heyrovský Institute of Physical Chemistry and Electrochemistry, Dolejškova 3, 182 23 Prgue 8
V. ChÁb
Affiliation:
Institute of Physics, Czech Academy of Sciences, Cukrovarnickd. 10, 162 00 Prague 6
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Abstract

Time resolved reflectivity curves (TRR) in combination with non-equilibrium thermal model are used to estimate the temperature interval of chemical reactions in the systems Ni-Si (100) and Ni-SiO2-Si (100) for a ∼ 500 nm thick Ni layer depending on the pulse energy density ranging from 0.5 J/cm 2 to 1.0 J/cm2. Numerical simulations are performed to calculate the temperature field within the system and to analyze the reactivity of the system.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 320: Symposium D – Silicides, Germanides, and Their Interfaces , 1993 , 415
Copyright
Copyright © Materials Research Society 1994

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References

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