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Kinetics and Thermodynamics of the Formation of Thin Film Titanium Diselicide

Published online by Cambridge University Press:  21 February 2011

R.J. Kasica ,
E.J. Cotts  and
R.G. Ahrens
R.J. Kasica
Affiliation:
Department of Physics, State University of New York at Binghamton, Binghamton, NY. 13902
E.J. Cotts
Affiliation:
Department of Physics, State University of New York at Binghamton, Binghamton, NY. 13902
R.G. Ahrens
Affiliation:
Department of Physics, State University of New York at Binghamton, Binghamton, NY. 13902
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Abstract

Multilayered difiiision couples consisting of alternating layers of titanium (Ti) and amorphous silicon (a-Si) have been fabricated using sputter deposition with a range of modulation lengths corresponding to an average composition of Ti33 Si67. We have used differential scanning calorimetry to measure the enthalpy evolved during the solid state reaction a-Si + Ti → C49-TiSi2 and have characterized the phases formed using x-ray diffraction analysis. An average measured enthalpy of formation, ΔΗ was found to be ΔΗ = -58 + 9 kJ/g atom for thin film samples. Using scanning and isothermal calorimetry measurements, we have also characterized the kinetics involved during the initial intermixing stage.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 398: Symposium C – Thermodynamics and Kinetics of Phase Transformations , 1995 , 301
Copyright
Copyright © Materials Research Society 1998

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References

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