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Ion Synthesis of Colloidal Silver Nanoclusters in the Organic Substrate

Published online by Cambridge University Press:  21 February 2011

A. L. Stepanov ,
S. N. Abdullin ,
R. I. Khaibullin ,
V. F. Valeev ,
Yu. N. Osin ,
V. V. Bazarov  and
I. B. Khaibullin
A. L. Stepanov
Affiliation:
Kazan Physical-Technical Institute, Lab. of Radiation Physics, Sibirsky Trakt 10/7, 420029 Kazan, Russia
S. N. Abdullin
Affiliation:
Kazan Physical-Technical Institute, Lab. of Radiation Physics, Sibirsky Trakt 10/7, 420029 Kazan, Russia
R. I. Khaibullin
Affiliation:
Kazan Physical-Technical Institute, Lab. of Radiation Physics, Sibirsky Trakt 10/7, 420029 Kazan, Russia
V. F. Valeev
Affiliation:
Kazan Physical-Technical Institute, Lab. of Radiation Physics, Sibirsky Trakt 10/7, 420029 Kazan, Russia
Yu. N. Osin
Affiliation:
Kazan Physical-Technical Institute, Lab. of Radiation Physics, Sibirsky Trakt 10/7, 420029 Kazan, Russia
V. V. Bazarov
Affiliation:
Kazan Physical-Technical Institute, Lab. of Radiation Physics, Sibirsky Trakt 10/7, 420029 Kazan, Russia
I. B. Khaibullin
Affiliation:
Kazan Physical-Technical Institute, Lab. of Radiation Physics, Sibirsky Trakt 10/7, 420029 Kazan, Russia
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Abstract

High-dose ion implantation was used to create silver metallic grains in the epoxy resins The structure and optical properties of Ag/organic systems were investigated by transmission electron microscopy and absorption UV-visible spectroscopy, It was established that silver implantation into the organic substrate produced colloidal nanoclusters in the near-surface region, whose average size and size distribution were function of dose value. The silver nanoclusters give rise to optical absorption at the plasmon wavelength. and maximum absorption was shown to be correlated with filling factors. The d.c. resistivities of irradiated samples were measured in temperature range from 5 to 300 K The observed exp(T0/T)n behaviour of resistivity indicated that synthesized metal particles are separated.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 392: Symposium U – Thin Films for Integrated Optics Applications , 1995 , 267
Copyright
Copyright © Materials Research Society 1995

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