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Ion Mixing Kinetics of Thin Layered Films in the Fe-Al System

Published online by Cambridge University Press:  25 February 2011

J. Grilhe ,
J.P. Riviere ,
J. Delafond  and
C. Jaouen
J. Grilhe
Affiliation:
Laboratoire de Métallurgie Physique, L.A. 131 du C.N.R.S. 40, avenue du Recteur Pineau 86022 Poitiers, (France)
J.P. Riviere
Affiliation:
Laboratoire de Métallurgie Physique, L.A. 131 du C.N.R.S. 40, avenue du Recteur Pineau 86022 Poitiers, (France)
J. Delafond
Affiliation:
Laboratoire de Métallurgie Physique, L.A. 131 du C.N.R.S. 40, avenue du Recteur Pineau 86022 Poitiers, (France)
C. Jaouen
Affiliation:
Laboratoire de Métallurgie Physique, L.A. 131 du C.N.R.S. 40, avenue du Recteur Pineau 86022 Poitiers, (France)
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Abstract

Evaporated bilayers and multilayers of Fe and Al have been studied during ion beam mixing with Xe ions using in-situ electrical resistivity measurements. Experiments have been performed in the composition range 40 – 58 at.% Al and at both temperatures 77 K and 300 K. A semi-empirical model is proposed to explain the observed kinetics. At low doses, a square root dependence of the mixed volume fraction on dose is found at 77 K but not at 300 K. The results are discussed by comparison with the different models proposed for ion beam mixing.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 27: Symposium E – Ion Implantation and Ion Beam Processing of Materials , 1983 , 133
Copyright
Copyright © Materials Research Society 1984

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References

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