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Ion Implantation Damage in Silicate Glasses

Published online by Cambridge University Press:  21 February 2011

George W. Arnold
George W. Arnold*
Affiliation:
Sandia National Laboratories Albuquerque, New Mexico, 87185, USA
*
* This work performed at Sandia National Laboratories supported by the U.S. Department of Energy under contact under number DE-AC04-76DP00789.
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Abstract

Ion implantation is a rapid technique for simulating damage induced by α-recoil nuclei in nuclear waste forms. The simulation has been found to be quite good in TEM comparisons with natural α-decay damage in minerals, but leach rate differences have been observed in glass studies and were attributed to dose-rate differences. The similarities between ion implantation and recoil nuclei as a means of producing damage suggest that insights into the long-term behavior of glass waste forms can be obtained by examination of what is known about ion-implantation damage in silicate glasses. This paper briefly reviews these effects and shows that leaching results in certain nuclear waste glasses can be understood as resulting from plastic flow and track overlap. Phase separation is also seen to be a possible consequence of damage-induced compositional changes.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 15: Symposium D – Scientific Basis for Nuclear Waste Management VI , 1982 , 423
Copyright
Copyright © Materials Research Society 1983

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References

REFERENCES

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