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Ion Implantation Damage in Silicate Glasses
Published online by Cambridge University Press: 21 February 2011
Abstract
Ion implantation is a rapid technique for simulating damage induced by α-recoil nuclei in nuclear waste forms. The simulation has been found to be quite good in TEM comparisons with natural α-decay damage in minerals, but leach rate differences have been observed in glass studies and were attributed to dose-rate differences. The similarities between ion implantation and recoil nuclei as a means of producing damage suggest that insights into the long-term behavior of glass waste forms can be obtained by examination of what is known about ion-implantation damage in silicate glasses. This paper briefly reviews these effects and shows that leaching results in certain nuclear waste glasses can be understood as resulting from plastic flow and track overlap. Phase separation is also seen to be a possible consequence of damage-induced compositional changes.
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- Copyright © Materials Research Society 1983
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