Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-29T10:40:03.225Z Has data issue: false hasContentIssue false

Ion Implantation and Ion Beam Analysis of Lithium Niobate

Published online by Cambridge University Press:  25 February 2011

G. W. Arnold*
Affiliation:
Sandia National Laboratories, Ion-Solid Interactions Division 1111, Albuquerque, NM 87185-5800
Get access

Abstract

Implantations of He and Ti were made into LiNbO3 and the H and Li profiles determined by elastic recoil detection (ERD) techniques. The loss of Li and gain of H depends upon the supply of surface H (surface contaminants or ambient atmosphere). For 50 keV He implants into LiNbO3 through a 200 Å Al film, the small Li loss is governed by the interface H. This is also the case for He implants into uncoated LiNbO3 in a beam line with low hydrocarbon surface contamination; similar implants under conditions of greater hydrocarbon deposition result in proportionally larger Li loss and H gain in the implant damage region. The exchange is possible only for those He energies, i.e., 50 keV, where the damage profile intersects the surface. For Ti implants Li is lost with little H gain. For this case the Li loss is believed to result from radiation-enhanced diffusion. Where He implantation is used to establish waveguiding in LiNbO3, the presence or absence of H in the implanted region is crucial with regard to refractive index stability, due to the replacement of H by Li from the bulk.

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Destefanis, G. L., Gaillard, J.-P., Ligeon, E. G., Vallette, S., Farmery, B. W., Townsend, P. D., and Perez, A., J. Appl. Phys. 50, 7898 (1979).CrossRefGoogle Scholar
2. Appleton, B. R., Beardsley, G. M., Farlow, G. C., Christie, W. H., and Ashley, P. R., J. Mater. Res. 1, 104 (1986).CrossRefGoogle Scholar
3. Ch. Buchal, Ashley, P. R., and Appleton, B. R., J. Mater. Res. 2, 222 (1987).Google Scholar
4. Al-Chalabi, S. A. M., Weiss, B. L., Barfoot, K. M., and Arnold, G. W., J. Appl. Phys. 63, 1032 (1988).CrossRefGoogle Scholar
5. Jackel, J. L. and Rice, C. E., Proceedings of SPIE 460, 43 (1984).Google Scholar
6. Arnold, G. W., Camera, A., Mazzi, G., and Mazzoldi, P., Mat. Res. Soc. Proc. Vol.101, 453 (1988).CrossRefGoogle Scholar
7. Chandler, P. J. and Townsend, P. D., Nucl. Instr. and Meth. B19/20, 921 (1987).CrossRefGoogle Scholar
8. Glavas, E., Zhang, L., Chandler, P. J., and Townsend, P. D., Nucl. Instr. and Meth. B32, 45 (1988).CrossRefGoogle Scholar
9. Armenise, M. N., Canali, C., DeSario, M., Carnera, A., Mazzoldi, P., and Celotti, G., J. Appl. Phys. 54, 62 (1983).CrossRefGoogle Scholar
10. Ziegler, J. F., Biersack, J. P., and Littmark, U., The Stopping and Range of Ions in Solids (Pergamon, New York, 1985).Google Scholar
11. Miotello, A. and Mazzoldi, P., J. Phys. C 16, 221 (1983).CrossRefGoogle Scholar
12. Gotz, G. and Karge, H., Nucl. Instr. and Meth. 209/210, 1079 (1983).CrossRefGoogle Scholar