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Ion Beam Sputtering of Erbium Doped Fluoroaluminate Glass Films

Published online by Cambridge University Press:  25 February 2011

M. W. Moore ,
S. T. Davey ,
W. J. M. Rothwell  and
P. J. Cannard
M. W. Moore
Affiliation:
BT Laboratories, Martlesham Heath, Ipswich LP5 7RE, UK
S. T. Davey
Affiliation:
BT Laboratories, Martlesham Heath, Ipswich LP5 7RE, UK
W. J. M. Rothwell
Affiliation:
BT Laboratories, Martlesham Heath, Ipswich LP5 7RE, UK
P. J. Cannard
Affiliation:
BT Laboratories, Martlesham Heath, Ipswich LP5 7RE, UK
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Abstract

Ar ion beam sputtering has been used to deposit fluoride glasses films up to a micron in thickness on silica and silicon substrates, Fluorozirconate films were found to be dark in colour, attributed to the presence of reduced chemical species. Fluoroaluminate films composed of fluorides less susceptible to reduction were clear and fluorescence from a layer doped with 2 wt% Er3+ is presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 279: Symposium A – Beam-Solid Interactions–Fundamentals and Applications , 1992 , 769
Copyright
Copyright © Materials Research Society 1993

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