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Investigations of Tin and Ti Film Deposition by Plasma Activated Cvd Using Cyclopentadienyl Cycloheptatrienyl Titanium, a Low Oxidation State Precursor

Published online by Cambridge University Press:  22 February 2011

Robert M. Charatan ,
Mihal E. Gross  and
David J. Eaglesham
Robert M. Charatan
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
Mihal E. Gross
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
David J. Eaglesham
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ 07974
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Abstract

Sequential Ti and TiN thin film deposition by CVD is highly desirable for advanced Si integrated circuit applications. To date, most CVD TiN work has been performed using Ti(IV) compounds. We have investigated plasma assisted CVD using a lower oxidation state precursor, cyclopentadienyl cycloheptatrienyl titanium, (C5H5)Ti(C7H7) (CPCHT), which might provide a more facile pathway to both Ti and TiN film formation. CPCHT was introduced with H2 carrier gas into the downstream region of an NH3, N2 or H2 plasma. Low resistivity (100-250 μΩ-cm), nitrogen rich TiN films with little C or O incorporation were deposited at 300 to 600°C, inclusive with either activated N2 or NH3. Although the film texture was influenced by the chosen plasma gas, the average grain size of the N2 and NH3 plasma deposits was similar. Annealing studies showed that the CVD TiN was an effective diffusion barrier between aluminum and silicon to at least 575°C. TEM micrographs revealed that, in contrast to many CVD metal films, the growth of this TiN was not columnar. Film conformality was investigated by scanning electron microscopy (SEM). Experiments performed with activated H2 resulted in deposits of Ti contaminated with C. No depositions were observed in the absence of plasma excitation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 334: Symposium W – Gas-Phase and Surface Chemistry in Electronic Materials Processing , 1993 , 329
Copyright
Copyright © Materials Research Society 1994

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References

1. Nicolet, M.-A., Thin Solid Films 52, 415 (1978).Google Scholar
2. For example, see Kurtz, R. and Gordon, R. G., Thin Solid Films 140, 277 (1986); N. J. Ianno, A. U. Ahmed and D. E. Englebert, J. Electrochem. Soc. 136, 276 (1989); F. Pintchovski, T. White, E. Travis, P. J. Tobin and J. B. Price, “Workshop on Tungsten and Other Refractory Materials for VLSI Applications, IV”, R. Blewer and C. McConica, eds., (Mat. Res. Soc., Pittsburgh, 1989) p. 323; A. Sherman, J. Electrochem. Soc. 137, 1892 (1990); N. Yokoyama, K. Hinode and Y. Homma, J. Electrochem. Soc. 138, 190 (1991); M. J. Buiting and A. F. Otterloo, J. Electrochem. Soc., 139, 2580 (1992).Google Scholar
3. Akahori, T., Tanihara, A. and Tano, M., Jap. J. Appl. Phys. 30, 3558 (1991).Google Scholar
4. Akahori, T., Tech. Proc. Semicon./Japan, Dec. 2-4, 1992, p. 364.Google Scholar
5. Fix, R. M., Gordon, R. G. and Hoffmann, D. M., Chem. Mater. 2, 235 (1990)Google Scholar
6. Sandhu, G. S., Meikle, S. G. and Doan, T.T., Appl. Phys.Lett. 62, 240 (1993)Google Scholar
7. Weber, A., Nikulski, R. and Klages, C.-P., Appl. Phys. Lett. 63, 325 (1993)Google Scholar
8. Intemann, A., Koerner, H. and Koch, F., J. Electrochem. Soc. 140, 3215 (1993).Google Scholar
9. a) Weber, A., Nikulski, R., Klages, C.-P., Gross, M. E., Brown, W. L., Dons, E. and Charatan, R. M., J. Electrochem. Soc., in press. b) M. E. Gross, A. Weber, R. Nikulski, C. -P. Klages, R. M. Charatan, W. L. Brown, E. Dons and D. J. Eaglesham, this volume, in press.Google Scholar
10. Oven, H. O. Van and Meijer, H. J. De Liefde, J. Organometal. Chem. 23, 159 (1970).Google Scholar
11. Groenenboom, C. J., Sawatzky, G., Meijer, H. J. De Liefde and Jellinek, F., J. Organometal. Chem. 76 C4 (1974).Google Scholar
12. Johnson, N. M., Walker, J. and Stevens, K. S., J. Appl. Phys. 69, 2361 (1991).Google Scholar