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Investigation of Laser-Induced Etching of Ti in Phosphoric Acid

Published online by Cambridge University Press:  15 February 2011

R. J. Nowak ,
S. M. Metev ,
K. B. Meteva  and
G. Sepold
R. J. Nowak
Affiliation:
BIAS Bremen Institute of Applied Beam Technology, Klagenfurterstr. 2, D-28359 Bremen, Germany
S. M. Metev
Affiliation:
BIAS Bremen Institute of Applied Beam Technology, Klagenfurterstr. 2, D-28359 Bremen, Germany
K. B. Meteva
Affiliation:
BIAS Bremen Institute of Applied Beam Technology, Klagenfurterstr. 2, D-28359 Bremen, Germany
G. Sepold
Affiliation:
BIAS Bremen Institute of Applied Beam Technology, Klagenfurterstr. 2, D-28359 Bremen, Germany
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Abstract

Laser-induced chemical etching of Ti in phosphoric acid has been investigated using cw Nd:YAG (1.064 μιm) and Argon lasers (514 nm) operating in the fundamental Gaussian mode. Two different regions of etching were observed, which are separated by a characteristic threshold value of the laser power and ascribed to melting of the metal. Below the threshold an exponential dependence of etch rates on laser power suggest a thermally activated etching mechanism. Time-resolved measurements indicate in this region the dissolution of the passivation layer followed by surface etching of the metal grains. After laser illumination an immediate repassivation of the re-cooled surface stops the etch reaction.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 397: Symposium B – Advanced laser Processing of Materials-Fundamentals and Applications , 1995 , 479
Copyright
Copyright © Materials Research Society 1996

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References

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