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Interference lithography for 3D photonic band gap crystal layer by layer fabrication

Published online by Cambridge University Press:  21 March 2011

A Feigel ,
Z. Kotler ,
B. Sfez ,
A. Arsh ,
M. Klebanov  and
V. Lyubin
A Feigel
Affiliation:
Electro-Optics Division, NRC Soreq, 81800 Yavne, Israel
Z. Kotler
Affiliation:
Electro-Optics Division, NRC Soreq, 81800 Yavne, Israel
B. Sfez
Affiliation:
Electro-Optics Division, NRC Soreq, 81800 Yavne, Israel
A. Arsh
Affiliation:
Physics Dept, Ben-Gurion University, 84105 Beer-Sheva, Israel
M. Klebanov
Affiliation:
Physics Dept, Ben-Gurion University, 84105 Beer-Sheva, Israel
V. Lyubin
Affiliation:
Physics Dept, Ben-Gurion University, 84105 Beer-Sheva, Israel
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Abstract

We present fabrication of 3D photonic band gap woodpile crystals from photosensitive chalcogenide glass with the help of interference lithography and layer by layer construction. The alignment method is described, which is scalable to extremely small feature sizes required for photonic crystals in the visible region.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 692: Symposium H – Progress in Semiconductor Materials for Optoelectronic Applications , 2001 , K2.9.1
Copyright
Copyright © Materials Research Society 2002

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References

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