Published online by Cambridge University Press: 15 February 2011
A strong resonance effect in the specular reflectivity of a C layer deposited on a Ni surface has been measured. The e.m. field intensity distribution has been monitored by measuring the fluorescence intensity of an ultra-thin Ti layer placed in the C film. The reflected intensity and the fluorescence yield of Ti and Ar (this last trapped in the film because of the deposition by sputtering) have been measured in different samples with a different location of the Ti layer. The results show that with this method a nondestructive, accurate determination of the Ti position can be achieved with a relative accuracy of 10−2