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Interference Effects In X-Ray Specular Reflectivity from Thin Films

Published online by Cambridge University Press:  15 February 2011

S. Lagomarsino ,
S. Di Fonzo ,
W. Jark ,
B. Muller ,
A. Cedola  and
G. Pelka
S. Lagomarsino
Affiliation:
Istituto di Elettronica dello Stato Solido - CNR V. Cineto Romano, 42 00156 Roma, (Italy)
S. Di Fonzo
Affiliation:
Sincrotrone Trieste - Padriciano 99, 34012 Trieste, (Italy)
W. Jark
Affiliation:
Sincrotrone Trieste - Padriciano 99, 34012 Trieste, (Italy)
B. Muller
Affiliation:
Sincrotrone Trieste - Padriciano 99, 34012 Trieste, (Italy)
A. Cedola
Affiliation:
Istituto di Elettronica dello Stato Solido - CNR V. Cineto Romano, 42 00156 Roma, (Italy)
G. Pelka
Affiliation:
Institute of Physics, Al. Lotnikov 32/48 -02-668 Warsaw, (Poland)
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Abstract

A strong resonance effect in the specular reflectivity of a C layer deposited on a Ni surface has been measured. The e.m. field intensity distribution has been monitored by measuring the fluorescence intensity of an ultra-thin Ti layer placed in the C film. The reflected intensity and the fluorescence yield of Ti and Ar (this last trapped in the film because of the deposition by sputtering) have been measured in different samples with a different location of the Ti layer. The results show that with this method a nondestructive, accurate determination of the Ti position can be achieved with a relative accuracy of 10−2

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 382: Symposium G – Structure and Properties of Multilayered Thin Films , 1995 , 381
Copyright
Copyright © Materials Research Society 1995

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References

REFERENCES

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