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In-Situ Optical Emission Spectra of Ti, TiN and TiSi2 Plasma During Thin Film Growth by Pulsed Laser Evaporation

Published online by Cambridge University Press:  15 February 2011

S. Pramanick  and
J. Narayan
S. Pramanick
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh NC 27695.
J. Narayan
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh NC 27695.
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Abstract

The first optical emission spectra of Ti, TiN and TiSi2 plasma during growth of thin films by pulsed laser evaporation has been reported. A KrF excimer laser (248nm) with pulsewidth of 45ns operating on 5Hz repitition rate was used for deposition of refractory metal thin films using varying laser fluence of 4J/cm2 to 15J/cm2. Most of the radiative species seen in plasma belongs to atomic neutrals and ionic species such as Ti I, Ti II, Si I, Si II and N 11. Emission spectra was mostly dominated by neutral and ionic emission from Titanium (Ti I and Ti II).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 250: Symposium R – Chemical Vapor Deposition of Refractory Metals and Ceramics II , 1991 , 125
Copyright
Copyright © Materials Research Society 1992

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References

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