Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by Crossref.
Wagner, Peter
Holm, Claus
Sirtl, Erhard
Oeder, Robert
and
Zulehner, Werner
1984.
Advances in Solid State Physics.
Vol. 24,
Issue. ,
p.
191.
INOUE, Naohisa
and
WADA, Kazumi
1987.
Oxygen in Silicon.
Tetsu-to-Hagane,
Vol. 73,
Issue. 8,
p.
947.
Babich, V. M.
Baran, N. P.
Bugai, A. A.
Konchits, A. A.
Kovalchuk, V. B.
Maksimenko, V. M.
and
Shanina, B. D.
1988.
Electrical and paramagnetic properties of thermodonors-II in silicon. Discussion of a model.
Physica Status Solidi (a),
Vol. 109,
Issue. 2,
p.
537.
Reiche, M
and
Breitenstein, O
1988.
Precipitation processes in silicon at 465 degrees C.
Semiconductor Science and Technology,
Vol. 3,
Issue. 6,
p.
529.
Babich, V. M.
Baran, N. P.
Dotsenko, Yu. P.
Zotov, K. I.
Kovalchuk, V. B.
and
Maksimenko, V. M.
1991.
Investigation of thermal donors generated in Cz-Si crystals by prolonged annealing at temperatures below 550 °C.
Physica Status Solidi (a),
Vol. 127,
Issue. 2,
p.
405.
Murray, R.
1991.
Hydrogen in Semiconductors.
p.
115.
Voronkov, V V
1993.
Generation of thermal donors in silicon: oxygen aggregation controlled by self-interstitials.
Semiconductor Science and Technology,
Vol. 8,
Issue. 12,
p.
2037.
Lindström, J.L.
and
Hallberg, T.
1996.
C,H,N and O in Si and Characterization and Simulation of Materials and Processes.
p.
150.
Lindström, J. L.
and
Hallberg, T.
1996.
Early Stages of Oxygen Precipitation in Silicon.
p.
41.
Shi, X.H.
Liu, P.L.
Shi, G.L.
and
Shen, S.C.
1998.
Annealing behavior of N–O complexes in Si grown under nitrogen atmosphere.
Solid State Communications,
Vol. 106,
Issue. 10,
p.
669.
2002.
Impurities and Defects in Group IV Elements, IV-IV and III-V Compounds. Part a: Group IV Elements.
Vol. 41A2a,
Issue. ,
p.
1.
2002.
Impurities and Defects in Group IV Elements, IV-IV and III-V Compounds. Part a: Group IV Elements.
Vol. 41A2a,
Issue. ,
p.
1.
Friedrich, Jochen
von Ammon, Wilfried
and
Müller, Georg
2015.
Handbook of Crystal Growth.
p.
45.