Published online by Cambridge University Press: 17 March 2011
Thin films of antimony sulpho iodide (SbSI) were grown on platinized silicon substrates by the pulsed laser deposition method. As grown films were amorphous and annealing at 250 °C for 5 minutes introduced crystallinity in the films. Infrared reflectance measurements were done in the frequency range ∼ 500 – 5000 cm−1 (wavelength ∼ 2–20 μm). The reflectance measurements were taken at temperatures above and below the ferroelectric transition of SbSI ∼ 20° C. The index of refraction for a (121) oriented film was determined to be 2.83 ± 0.35 at a temperature of 25.6 °C, and 2.80 ± 0.35 at a temperature of 9.6 °C. For a (002) oriented film, the index was 3.82 ± 0.48 at a temperature of 26.5 °C, and 3.76 ± 0.48 at a temperature of 8.0 °C. Pyro-optic coefficients of 1.5 × 10−3 °C−1 for the (121) oriented film, and 3.2 × 10−3 °C−1 for the (002) oriented film were obtained. These results are consistent with measurements done in the visible region, and demonstrate the potential of SbSI as an infrared detector material.