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Infrared Characterization of RF Sputter Etching of Polyimide Thin Films

Published online by Cambridge University Press:  25 February 2011

S.E. Molis ,
D.G. Kim ,
S.P. Kowalczyk  and
J. Kim
S.E. Molis
Affiliation:
IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598
D.G. Kim
Affiliation:
IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598
S.P. Kowalczyk
Affiliation:
IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598
J. Kim
Affiliation:
IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598
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Abstract

We present infrared spectroscopy as a means of characterizing polyimide structural changes occurring by RF argon ion sputtering. Samples of PMDA-ODA polyimide on chromium coated substrates have been sputter etched from initial thicknesses of 400 Å down to 10 Å. Relative intensity changes in imide vibrational absorption bands have been interpreted in terms of orientational reordering which occurs during the ion sputtering process. The appearance of a new vibration at 1580 cm–1 in the spectra of samples etched below 50 Å is assigned as the Elu mode of graphite corresponding to a surface damage layer which is of a graphitic form.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 203: Symposium D – Electronic Packaging Materials Science V , 1990 , 53
Copyright
Copyright © Materials Research Society 1991

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References

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