Hostname: page-component-586b7cd67f-l7hp2 Total loading time: 0 Render date: 2024-11-29T08:56:35.823Z Has data issue: false hasContentIssue false

Influence of The Electrochemical Environment on Diffusion Processes Near Step and Island Edges: Ag(111) and Ag(100)

Published online by Cambridge University Press:  15 February 2011

Michael I. Haftel
Affiliation:
Code 6331, Naval Research Laboratory, Washington, DC. 20375-5343 Department of Physics, University of Maryland, College Park, MD 20742-4111
T. L. Einstein
Affiliation:
Department of Physics, University of Maryland, College Park, MD 20742-4111
Get access

Abstract

The electrochemical cell provides a potentially powerful means of altering morphology and islanding phenomena on metallic surfaces. Diffusion and attachment processes on terraces and near step and island edges are known to profoundly affect island sizes, shapes and coarsening kinetics. Using the surface-embedded-atom-model (SEAM) for describing metallic surfaces in the electrolytic environment, we calculate the dependence of the activation energies for the aforementioned diffusion processes on the deposited surface charge for the Ag(111) and Ag(100) surfaces in an electrolytic environment. While all these processes show some degree of dependence on the potential, the step-edge barrier and the edge diffusion processes are the most sensitive. Step-edge barriers increase (to over 1 eV) with large positive potential (0.85 V), while edge diffusion barriers monotonically decrease with positive surface charge on Ag(100) and Ag(111). We assess the effect these diffusion barriers have on island size/shapes and coarsening dynamics and discuss the implications on electrochemical tuning of islanding phenomena.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Corcoran, S.G., Chakarova, G.S., and Sieradzki, K., Phys. Rev. Lett. 71, 1585 (1993).Google Scholar
[2] Möller, F.A., Magnussen, O.M., and Behm, R.J., Phys. Rev. Lett. 77, 3165 (1996).Google Scholar
[3] Lucas, C.A., Markovic, N.M., and Ross, P.N., Phys. Rev. Lett. 77, 4922 (1996).Google Scholar
[4] Kolb, D.M., Prog. Surf. Sci. 51, 109 (1996).Google Scholar
[5] Eaglesham, D.J. and Cerullo, M., Phys. Rev. Lett. 64, 1943 (1990).Google Scholar
[6] Fu, C.L. and Ho, K.M., Phys. Rev. Lett. 63, 1617 (1989).Google Scholar
[7] Bohnen, K.P. and Kolb, D.M., Surf. Sci. 407, L629 (1998).Google Scholar
[8] Daw, M.S. and Baskes, M.I., Phys. Rev. B 29, 6443 (1984).Google Scholar
[9] Wen, J.M., Chang, S.L., Burnett, J.W., Evans, J.W., and Thiel, P.A., Phys. Rev. Lett. 73, 2591 (1994).Google Scholar
[10] Pai, W.W., Swan, A.K., Zhang, Z., and Wendelken, J.F., Phys. Rev. Lett. 79, 3210 (1997).Google Scholar
[11] Stoldt, C.R., Jenks, C.J., Thiel, P.A., Cadilhe, A.M., and Evans, J.W., J. Chem. Phys. 111, 5157 (1999).Google Scholar
[12] Brune, H., Rdder, H., Boragno, C., and Kern, K., Phys. Rev. Lett. 73, 1955 (1994).Google Scholar
[13] Heinonen, J., Koponen, I., Merikoski, J., and Ala-Nissila, T., Phys. Rev. Lett. 82, 2733 (1999).Google Scholar
[14] Pal, S. and Fichthorn, K.A., Phys. Rev. B 60, 7804 (1999).Google Scholar
[15] Haftel, M.I. and Rosen, M., Phys. Rev. B 51, 4426 (1995).Google Scholar
[16] Haftel, M.I. and Rosen, M., Surf. Sci. 407, 16 (1998).Google Scholar
[17] Haftel, M.I., Rosen, M., and Corcoran, S.G., Mat. Res. Soc. Symp. 451, 31 (1997).Google Scholar
[18] Wolfgang Schmickler, Interfacial Electrochemistry, Oxford University Press, New York (1996), p26.Google Scholar
[19] Haftel, M.I. and Rosen, M., Bull. Am. Phys. Soc. 44, 1831 (1999).Google Scholar
[20] Hamelin, A. and Stoicoviciu, L., J. Electroanal. Chem. 234, 93 (1987).Google Scholar
[21] Yu, B.D. and Scheffler, M., Phys. Rev. B 56, R15569 (1997).Google Scholar
[22] Amar, J.G., Family, F., and Lam, P.-M., Phys. Rev. B 50, 8781 (1994).Google Scholar
[23] Zhang, T., Zhong, J., Zhang, Z., and Lagally, M.G., preprint (1999).Google Scholar
[24] Khare, S.V. and Einstein, T.L., Phys. Rev. B 54, 11752 (1996).Google Scholar