Hostname: page-component-586b7cd67f-t7fkt Total loading time: 0 Render date: 2024-11-25T17:55:13.509Z Has data issue: false hasContentIssue false

The Influence of Ion Bombardment on the Surface Composition of 70 wt% Cu-30 wt% Zn Alpha-Brass

Published online by Cambridge University Press:  16 February 2011

Vjekoslav Franetovic*
Affiliation:
General Motors Research Laboratories, Warren, MI 48090–9055
Get access

Abstract

The short time ion bombardment during ion milling resulted in a dramatic change in the surface composition of alpha-brass, selectively removing up to 2/3 of the Zn atoms during the first 5 to 10 minutes of ion milling. This differential sputtering occurred at various ion beam energies and at target temperatures as low as −196°C (LN2 temperature). The effect of differential sputtering completely disappeared after ion milling times in excess of three hours. Such a dramatic change in composition could not be attributed either to a difference in sputtering yield or to different ion milling conditions. It was shown that under constant ion milling conditions this differential sputtering depends strongly and only on the condition of the foil surface. The unexpected disappearance of the effect of differential sputtering with time was attributed to stabilization of a characteristic surface topography produced by long time ion bombardment.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Goodhew, P. J., Thin Foil Preparation for Electron Microscopy, (Elsevier Science Publishers B. V., New York, 1985), pp. 103116.Google Scholar
2. Hirsch, P., Howie, A., Nicholson, R. B., Pashley, D. W., and Whelan, M. J., Electron Microscopy of Thin Crystals, (R. E. Krieger Publishing Co., Inc., New York, 1977), pp. 2450.Google Scholar
3. Kay, D., Techniques for Electron Microscopy, 2nd ed. (Blackwell Scientific Publications Ltd., Oxford, 1967), pp. 356411.Google Scholar
4. Singh, A. K., Imam, M. A., Michel, D. J., and Sadananda, K., Mat. Res. Soc. Symp.Proc., 115, 1987, pp. 161165.Google Scholar
5. Maissel, L. I. and Glang, R., Handbook of Thin Film Technology, (McGraw- Hill Co., New York, 1970), p. 315.Google Scholar
6. Hass, G. and Thun, R. E., Physics of Thin Films, (Academic Press, New York, 1966), p. 99.Google Scholar
7. Czanderna, A. W., Methods of Surface Analysis, (Elsevier Scientific Publishing Co., New York, 1975), pp. 1827.Google Scholar