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The Influence of Hydrogen Plasma Passivation on Electrical and Optical Properties of Aigan Samples Grown on Sapphire

Published online by Cambridge University Press:  15 February 2011

A. Y. Polyakov ,
M. Shin ,
S. J. Pearton ,
M. Skowronski ,
D. W. Greve  and
J. A. Freitas
A. Y. Polyakov
Affiliation:
Department of Materials Science & Engineering, Carnegie Mellon University, Pittsburgh, PA 15213–3890, [email protected]
M. Shin
Affiliation:
Department of Materials Science & Engineering, Carnegie Mellon University, Pittsburgh, PA 15213–3890, [email protected]
S. J. Pearton
Affiliation:
Department of Materials Science and Engineering, University of Florida, 132 Rhines Hall, Gainesville, Florida, FL 32611–6400
M. Skowronski
Affiliation:
Department of Materials Science & Engineering, Carnegie Mellon University, Pittsburgh, PA 15213–3890, [email protected]
D. W. Greve
Affiliation:
Department of Electronic and Computer Engineering, Carnegie Mellon University, Pittsburgh, PA 15213–3890
J. A. Freitas
Affiliation:
Sach/Freeman Assoc. Inc. Landover, MD 20785, Naval Research Lab.: Contract # N00014- 93-C-2227
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Abstract

Hydrogen plasma passivation effects are studied for undoped AlGaN layers grown by MOCVD. Hydrogen treatment at 200°C for lh led to a substantial decrease in carrier concentration accompanied by an increase in electron mobility. The magnitude of the near-band edge absorption tails also dramatically decreased after hydrogen passivation. The effect is explained by pairing of negatively charged hydrogen acceptors with positively charged native donors commonly believed to be related to nitrogen vacancies. The bond strength in such hydrogen complexes increases as the composition of AlGaN moves towards AIN, as revealed by results of post hydrogenation annealing.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 423: Symposium E – III-Nitride, SiC, and Diamond Materials for Electronic , 1996 , 607
Copyright
Copyright © Materials Research Society 1996

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