Hostname: page-component-cd9895bd7-8ctnn Total loading time: 0 Render date: 2024-12-27T02:17:10.706Z Has data issue: false hasContentIssue false

Influence of Atmospheric Pressure Torch Plasma Irradiation on Plant Growth

Published online by Cambridge University Press:  21 May 2012

Yusuke Akiyoshi
Affiliation:
Faculty of Science and Engineering, Saga University, 1 Honjo-machi, Saga, 840-8502, Japan
Nobuya Hayashi
Affiliation:
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, 6-1 Kasuga-koen, Kasuga-shi, Fukuoka 816-8580
Satoshi Kitazaki
Affiliation:
Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Kazunori Koga
Affiliation:
Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Masaharu Shiratani
Affiliation:
Graduate School and Faculty of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Get access

Abstract

Growth enhancement characteristics of plants are investigated using an atmospheric discharge plasma. Atmospheric pressure plasma torch is consisted of alumina ceramics tube and the steel mesh electrodes wound inside and outside of the tube. The growth enhancement was observed in the length of stem and root of plants after the plasma irradiation to seeds. The stem length increases approximately 2.8 times after the cultivation time of 24 h. And the effect is found to be maintained for 40 h, after sowing seeds. The mechanism of the growth enhancement would be the redox reaction inside plant cells induced by oxygen radicals.

Type
Research Article
Copyright
Copyright © Materials Research Society 2012

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Tsukamoto, S., Maeda, T., Ikeda, M., and Akiyama, H.: J. Plasma Fusion Res. 79 (2003) 39.Google Scholar
2. Mizukami, K., Satoh, K., Kanayama, H., Itoh, H., Tagashira, H., Shimozuma, M., Okamoto, H.,Google Scholar
3. Takasaki, S., and Kinoshita, M.: IEEJ Trans. Fundamentals and Materials 126 (2006) 688 [in Japanese].Google Scholar
4. Bai, X. Y., Chen, Z. L., Ma, W. T., Jian, Z. R., Liu, S. Y., Li, C. Y., and Li, X. L.: J. Inst. Electrostat. Jpn. 8 (1984) 339.Google Scholar
5. Kitazaki, S., Koga, K., Shiratani, M., and Hayashi, N.: Proc. AVS 57th Int. Symp., 2010, p.670.Google Scholar
6. Dubinov, A. E., Lazarenko, E. M., and Selemir, V. D.: IEEE Trans. Plasma Sci. 28 (2000) 180.Google Scholar
7. Hayashi, N., Nakahigashi, A., Goto, M., Kitazaki, S., Koga, K., and Shiratani, M.: Jpn. J. Appl Phys. 50 (2010) 08JF04.Google Scholar
8. Einaga, H., Yoshihara, E., Matsuo, Y., and Yodoi, J.: J. Anal. Biosci. 32 (2009) 265.Google Scholar