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Improving Signal-to-Noise Limits in High Resolution Transmission Electron Microscopy

Published online by Cambridge University Press:  26 February 2011

J.M. Gibson  and
M.L. McDonald
J.M. Gibson
Affiliation:
At&t Bell Laboratories, 600 Mountain Avenue, Murray Hill, NJ 07974
M.L. McDonald
Affiliation:
At&t Bell Laboratories, 600 Mountain Avenue, Murray Hill, NJ 07974
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Abstract

Signal-to-noise ratios for Si <110> lattice images are measured for a variety of different specimen preparation techniques, including ion-milling, chemical polishing, cleavage and in-situ surface cleaning by heating. The noise levels are significantly lower in the latter, possibly permitting new classes of experiments in image quantitation and impurity imaging.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 82: Symposium I – Characterization of Defects in Materials , 1986 , 109
Copyright
Copyright © Materials Research Society 1987

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References

REFERENCES

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6. Gibson, J.M., McDonald, M.L. and Unterwald, F.C., to appear in UltramicroscopyGoogle Scholar