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The Implementation of Dilute Chemistries In Semiconductor Manufacturing

Published online by Cambridge University Press:  10 February 2011

Ron Sanders ,
Fuyu Lin  and
Pat Schay
Ron Sanders
Affiliation:
Advanced Custom Technologies, Motorola, 2200 W Broadway Rd., Mesa, AZ 852202
Fuyu Lin
Affiliation:
Advanced Custom Technologies, Motorola, 2200 W Broadway Rd., Mesa, AZ 852202
Pat Schay
Affiliation:
Advanced Custom Technologies, Motorola, 2200 W Broadway Rd., Mesa, AZ 852202
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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 447: Symposium L – Environmental, Safety, and Health Issues in IC Pro…… , 1996 , 21
Copyright
Copyright © Materials Research Society 1997

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References

1 Helms, C.R., NIST workshop on Semiconductor Characterization, January, 1995.Google Scholar
2 Burggraat, P.S., “Wafer Cleaning”, Semiconductor International, p86, June, 1994.Google Scholar
3 Heyns, M.M., Meuris, M., Mertens, P.W., Hurd, T.Q., Schmidt, H.F., Verhaverbeke, S., Hatcher, Z., and Graf, D., I. 34, IMEC annual report 1994.Google Scholar
4 Ohmi, T., Technical Digest, 1989 IEDM, p49.Google Scholar
5 Christenson, K., Smith, S.M., Nelson, S., Carlson, B., Bode, C., and Johnson, K., Electrochem. Soc, Oct 1995.Google Scholar
6 Marra, J., Particles in Gases and Liquids 3: Detection, Characterization, and Control, p269, Plenum Press, New York, 1993.Google Scholar
7 Christenson, K., FSI Technical Report 378, Oct 1991.Google Scholar