Hostname: page-component-78c5997874-dh8gc Total loading time: 0 Render date: 2024-11-06T10:39:08.468Z Has data issue: false hasContentIssue false

Hydrogen Passivation of Shallow Dopants in InP Studied by Photoluminescence Spectroscopy

Published online by Cambridge University Press:  26 February 2011

Sathya Balasubramanian
Affiliation:
Department of Physics, Indian Institute of Science, Bangalore -560 012,
Vikram Kumar
Affiliation:
Solid State Physics Laboratory, Lucknow Road, Delhi - 110 054, India
Get access

Abstract

The effect of hydrogenation on the photoluminescence (PL) of InP : Mg, InP : Zn and undoped n-InP is presented. An increase in the near band edge pl intensity due to passivation of non-radiative centers was observed in all the samples. A donor - acceptor pair transition was observed before hydrogenation in the InP : Mg sample and after hydrogenation in the InP : Zn sample due to the acceptor deactivation. In n-InP the enhancement of donor bound exciton after hydrogenation points to the absence of donor passivation.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Pearton, S.J., Corbett, J.W., and Shi, T.S., Appl. Phys. A 43, 153 (1987).Google Scholar
[2] Pearton, S.J., Corbett, J.W. and Stavola, M., Hydrogen in Crystalline Semiconductors (Springer, Berlin, 1992).Google Scholar
[3] Weber, J. and Singh, M., Mat. Res. Soc. Symop. Proc. 104, 25 (1988).Google Scholar
[4] Dautremont-Smith, W.C., Nabity, J.C., Swaminathan, V., Stavola, M., Chevallier, J., Tu, C.W., and Pearton, S.J., Appl. Phys. lett. 49, 1098 (1986).Google Scholar
[5] Dautremont-Smith, W.C., Lopata, J., Pearton, S.J., Koszi, L.A., Stavola, M., and Swaminathan, V., J. Appl. Phys. 66, 1993 (1989).Google Scholar
[6] Swaminathan, V., Lopata, J., Slusky, S.E.G., Dautremont-Smith, W.C. and Pearton, S.J., Defect Control in Semiconductors, Ed. Sumino, K. (Elsevier Science Publishers B.V., North-Holland, 1990).Google Scholar
[7] Zavada, J.M., Voillot, F., Lauret, N., Wilson, R.G., and Theys, B., J.Appl. Phys. 73, 8489 (1993).Google Scholar
[8] Lord, S.M., Roos, G., Harris, J.H. Jr., and Johnson, N.M., J.Appl. Phys. 73, 740 (1993).Google Scholar
[9] Hayes, T.R., Indium Phosphide and related materials: Processing, Technology and Devices. Ed. Katz, Avishay (Artech House, Boston, 1991).Google Scholar
[10] Balasubramanian, Sathya, Kumar, Vikram, and Balasubramanian, N. Appl. Phys. Lett. 64, 1696 (1994).Google Scholar
[11] Yamada, A., Makita, Y., Kimura, S., Asakura, H., Matsumori, T., Beye, A.C., and Mayer, K.M., Mat. Sci. and Engg. B9, 319 (1991).Google Scholar
[12] Swaminathan, V., Donneley, V.M., and Long, J.., J. Appl. Phys. 58, 4565 (1985).Google Scholar
[13] Temkin, H., Dutt, B.V., and Bonner, W.A., Appl. Phys. Lett. 38, 431 (1981).Google Scholar
[14] Hess, K., Stath, N. and Benz, K.W. J.Electrochem.Soc. 121, 1208 (1974).Google Scholar
[15] Weber, J., Pearton, S.J. and Dautremont-Smith, W.C. Appl. Phys. Lett. 49, 1181 (1986)Google Scholar
[16] Chevallier, J., Dautremont-Smith, W.C., Tu, C.W. and Pearton, S.J. Appl. Phys. Lett. 47, 108 (1985).Google Scholar