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Hydrogen Density of States Model for Amorphous Silicon and Alloys
Published online by Cambridge University Press: 21 February 2011
Abstract
It is proposed that hydrogen reactions near the growing surface control the structure of plasma-deposited amorphous silicon and its alloys. The model explains how the plasma influences the dangling bond density and silicon weak bond distribution, which are the main parameters influencing the electronic properties. The hydrogen interactions account for the dependence of the electronic structure on growth conditions, the transition to microcrystalline growth in hydrogen-rich plasmas, and the different electronic properties of a-Si:H alloys. The proposed growth mechanisms are closely related to the metastability phenomena which occur in bulk a-Si:H films.
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- Copyright © Materials Research Society 1991
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