Hostname: page-component-586b7cd67f-t7czq Total loading time: 0 Render date: 2024-11-29T07:43:31.800Z Has data issue: false hasContentIssue false
  • English
  • Français

Homogeneous and Heterogeneous Chemistry of Methane Deposition Plasmas

Published online by Cambridge University Press:  28 February 2011

W. O. Partlow  and
L. E. Kline
W. O. Partlow
Affiliation:
Westinghouse R&D Center, 1310 Beulah Road, Pittsburgh, PA 15235
L. E. Kline
Affiliation:
Westinghouse R&D Center, 1310 Beulah Road, Pittsburgh, PA 15235
Get access

Abstract

Experimental measurements and theoretical modeling of methane deposition plasmas have made it possible to determine the most likely homogeneous and heterogeneous chemical reaction paths leading to deposition of hydrogenated carbon from the fragments of electron dissociated methane.The methane plasma was modeled as a plug-flow reactor.Gas phase reactions, diffusive transport, variable surface reflection coefficients, and surface chemical reactions are included in the model which follows a “plug” of gas as it flows through the reactor.Boltzmann equation and Monte Carlo calculations were used to determine the electron energy distribution and the resulting dissociation and ionization rate coefficients averaged over space and time.Experimental measurements of the time dependent electrical properties of the plasma are used as input to the model.Deposition rates, deposition uniformity, downstream mass spectroscopy, and the dependences of these quantities on power and mass flow rates are compared to the model to arrive at a consistent representation of the deposition chemistry.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 68: Symposium C – Plasma Processing , 1986 , 309
Copyright
Copyright © Materials Research Society 1986

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Hayashi, Makoto, 6th Symposium on Dry Process, Tokyo, Japan, October, 1984.Google Scholar
2. Kline, Laurence E., IEEE Transactions on Plasma Science PS-IO, No. 4, 224 (1982).Google Scholar
3. Tsang, W. and Hampson, R.F., ”Chemical Kinetics Data Base for Methane Combustion”, NBS Report NBSIR-84–2913, (1984).Google Scholar
4. Albritten, D.L., Atomic Data and Nuclear Tables 22, 1 (1978).Google Scholar
5. Tachibana, K., Nishida, M., Harima, H., and Urano, Y., J.Phys.D: Appl.Phys 17, 1727 (1984); K.Tachibana, T.Okuyama, H.Harima, and Y.Urano, Int'l Symposium on Plasma Chemistry, Eindhoven, July, 1985.Google Scholar
6. Chapman, Brian, “Glow Discharge Processes”, (John Wiley & Sons, New York, 1980), p.53, 69.Google Scholar
7. Catherine, Y., Couderc, P., and Grolleau, B., 7th International Symposium on Plasma Chemistry, Endhoven, The Netherlands, July, 1985.Google Scholar
8. Gottscho, R.A. and Mandich, M.L., J.Vac.Sci.Tech.(To be published).Google Scholar
9. Rockwood, S.D., Phys.Rev. A8, 2348 (1973).Google Scholar
10. Lacina, W.B., ”Theoretical Modeling of Molecular and Electronic Kinetic Processes”, Final Report, Office of Naval Research Contract No.N00014–78–0499, Jan.1979.Google Scholar
11. Kline, L.E., (IEEE Transactions on Plasma Science PS-19, (1986).Google Scholar
12. Frost, L.S. and Phelps, A.V., Phys.Rev. 127, 1621 (1962).Google Scholar
13. Gear, C.W., ”Numerical Initial Value Problems in Ordinary Differential Equations”, (Prentiss-Hall, Englewood Cliffs, NJ, 1971).Google Scholar
14. Chantry, P.J., (private communication).Google Scholar
15. McDaniel, E.W., ”Collisional Phenomena in Ionized Gases”, (Wiley, New York, 1964).Google Scholar
16. Chantry, P.J., Phelps, A.V., and Shultz, G.J., Phys.Rev. 152, 81 (1966).Google Scholar
17. Edelson, D. and Flamm, D., J.Appl.Phys. 56, 1522 (1984).CrossRefGoogle Scholar
18. Rettner, C.T., Pfnur, H.E., and Auerbach, D.J., Phys.Rev.Lett. 54, 2716 (1985).Google Scholar