Published online by Cambridge University Press: 28 February 2011
A low pressure plasma spraying technique for depositing high-Tc YBCO thick films has been developed. Films with thickness ranging 20–100 μm have been prepared using Y0.3Ba0.7CuOx powders. After post-annealing in oxygen for 1h at 930–950°C, the films, which were deposited on nimonic alloy substrate heated at 650°C during spraying, exhibited a zero resistance temperature of 90.6K with transition width (90%-10%) of 2K and a critical current density (77K, 0T) of 690 A/cm2.