Hostname: page-component-586b7cd67f-rdxmf Total loading time: 0 Render date: 2024-11-20T08:25:54.573Z Has data issue: false hasContentIssue false
  • English
  • Français

High-Resolution X-Ray Photoemission Electron Microscopy at the Advanced Light Source

Published online by Cambridge University Press:  10 February 2011

Thomas Stammler ,
Simone Anders ,
Howard A. Padmore ,
Joachim Stöhr ,
Michael Scheinfein  and
Harald Ade
Thomas Stammler
Affiliation:
Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720
Simone Anders
Affiliation:
Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720
Howard A. Padmore
Affiliation:
Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720
Joachim Stöhr
Affiliation:
IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120
Michael Scheinfein
Affiliation:
Department of Physics and Astronomy, Arizona State University, Tempe, AZ 85287
Harald Ade
Affiliation:
Department of Physics, North Carolina State University, Raleigh, NC 27695
Get access

Abstract

X-ray Photoemission Electron Microscopy (X-PEEM) is a full-field imaging technique where the sample is illuminated by an x-ray beam and the photoemitted electrons are imaged on a screen by means of an electron optics. It therefore combines two well-established materials analysis techniques - photoemission electron microscopy (PEEM) and x-ray spectroscopy such as near edge x-ray absorption fine structure (NEXAFS) spectroscopy. This combination opens a wide field of new applications in materials research and has proven to be a powerful tool to investigate simultaneously topological, elemental, chemical state, and magnetic properties of surfaces, thin films, and multilayers at high spatial resolution. A new X-PEEM installed at the bend magnet beamline 7.3.1.1 at the Advanced Light Source (ALS) is designed for a spatial resolution of 20 nm and is currently under commissioning. An overview of the ongoing experimental program using X-PEEM in the field of materials research at the ALS is given by elemental and chemical bonding contrast imaging of hard disk coatings and sliders, field emission studies on diamond films as possible candidates for field-emission flat-panel displays, and the study of dewetting and decomposition phenomena of thin polymer blends and bilayers.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 524: Symposium V – Application of Synchrotron Radiation Techniques…IV , 1998 , 25
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Stöhr, J., NEXAFS Spectroscopy, New York: Springer, 1992.Google Scholar
[2] Schütz, G., Wagner, W., Wilhelm, W., Kienle, P., Zeller, R., Frahm, R., and Materlik, G., Phys. Rev. Lett. 58, 737 (1987)Google Scholar
[3] Bauer, E., Franz, T., Koziol, C., Lilienkamp, G., Schmidt, T., in: Chemical, Structural and Electronic Analysis of Heterogeneous Surfaces on the Nanometer Scale, edited by Rosei, R., Kluwer Academic, Dordrecht, in press.Google Scholar
[4] Fink, R., Weiss, M.R., Umbach, E., Preikszas, D., Rose, H., Spehr, R., Hartel, P., Engel, W., Degenhardt, R., Wichendahl, R., Kuhlenbeck, H., Erlebach, W., Ihmann, K., Schlögl, R., Freund, H.-J., Bradshaw, A.M., Lilienkamp, G., Schmidt, Th., Bauer, E., Benner, G., Journal of Electron Spectroscopy and Related Phenomena 84 (1997) 231–250.Google Scholar
[5] Watts, R.N., Liang, S., Levine, Z.H., Lucatorto, T.B., Polack, F., and Scheinfein, M.R., Rev. Sci. Instrum. 68 (1997) 3464–3476.Google Scholar
[6] Tonner, B.P., Dunham, D., Droubay, T., and Pauli, M., Journal of Electron Spectroscopy and Related Phenomena 84 (1997) 211.Google Scholar
[7] Anders, S., Stammler, Th., Bhatia, C.Singh, Stöhr, J., Fong, W., and Bogy, D. B., Spring Meeting of the Material Research Society, San Francisco, 1998, to be published.Google Scholar
[8] Winesett, D. A., Ade, H., Smith, A. P., Rafailovich, M., Sokolov, S., and Slep, D., Microscopy and Microanalysis, to be published (1998).Google Scholar
[9] Anders, S., Stammler, Th., Ade, H., Rafailovich, M., Sokolov, J., Slep, D., Heske, C., and Stöhr, J, to be published.Google Scholar