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High-Quality AlGaN/GaN HFET Structures Grown by MOCVD Using Intermediate High Temperature AlGaN/GaN Superlattices
Published online by Cambridge University Press: 11 February 2011
Abstract
We report on device quality Al0.28Ga0.72N/GaN heterostructures growth by low-pressure metalorganic chemical vapor deposition (LP-MOCVD) using intermediate AlxGa1-xN/GaN superlattices (SL) with x<0.15. High-quality Al0.28Ga0.72N/GaN heterostructures have been confirmed with HRXRD analysis by measurement of mosaic twist and tilt in growth films, SEM with selective etching and Van der Pauw Hall measurements. The edge and threading dislocations were efficiently filtered by the AlGaN/GaN SL resulting in further reduction dislocation densities at the channel. Additionally, the superlattice served to improve the planarity of the channel heterointerface as evidenced by x-ray and AFM analysis. The increase of 2-DEG mobility from ∼1187 cm2/V s to ∼1443 cm2/V s was obtained at the carrier density of 1.0 to 1.2×1013 cm−2 on heterostructures with intermediate AlGaN/GaN SL grown on sapphire.
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- Copyright © Materials Research Society 2003
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