Published online by Cambridge University Press: 17 March 2011
Hot-Wire deposited amorphous silicon is an excellent material for the incorporation as the absorbing layer in n-i-p solar cells. We decreased the deposition temperature from 430 °C to 250 °C, keeping device quality (opto-)electrical properties of the a-Si:H layers. This enables application of Hot-Wire deposited a-Si:H in p-i-n structures and tandem solar cells. Layers deposited at 250 °C have been applied in efficient n-i-p and n-i-p/n-i-p solar cells. The deposition rate of the intrinsic layer was about 10 Å/s. No optical enhancements, like texturing or back reflectors, were used. Single-junction cells with a fill factor of 0.72 and an open-circuit voltage of 0.89 V have been produced. On a flexible stainless steel substrate, an initial efficiency of 7.2 % was recorded. Tandem cells also show a high fill factor (0.71) and open-circuit voltage (1.70 V), resulting in an initial efficiency of 8.5 %.