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High Resolution Resists for Next Generation Lithography: The Nanocomposite Approach

Published online by Cambridge University Press:  17 March 2011

Kenneth E. Gonsalves ,
Hengpeng Wu ,
Yongqi Hu  and
Lhadi Merhari
Kenneth E. Gonsalves
Affiliation:
Polymer Program at the Institute of Materials Science &, Department of Chemistry University of Connecticut, Storrs, CT 06268, USA, [email protected]
Hengpeng Wu
Affiliation:
Polymer Program at the Institute of Materials Science &, Department of Chemistry University of Connecticut, Storrs, CT 06268, USA, [email protected]
Yongqi Hu
Affiliation:
Polymer Program at the Institute of Materials Science &, Department of Chemistry University of Connecticut, Storrs, CT 06268, USA, [email protected]
Lhadi Merhari
Affiliation:
CERAMEC R&D, F-87000, Limoges, France, [email protected]
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Abstract

The SIA roadmap predicts mass production of sub-100 nm resolution circuits by 2006. This not only imposes major constraints on next generation lithographic tools but also requires that new resists capable of accommodating such a high resolution be synthesized and developed concurrently. Except for ion beam lithography, DUV, X-ray, and in particular electron beam lithography suffer significantly from proximity effects, leading to severe degradation of resolution in classical resists. We report a new class of resists based on organic/inorganic nanocomposites having a structure that reduces the proximity effects. Synthetic routes are described for a ZEP520®nano-SiO2 resist where 47nm wide lines have been written with a 40 nm diameter, 20 keV electron beam at no sensitivity cost. Other resist systems based on polyhedral oligosilsesquioxane copolymerized with MMA, TBMA, MMA and a proprietary PAG are also presented. These nanocomposite resists suitable for DUV and electron beam lithography show enhancement in both contrast and RIE resistance in oxygen. Tentative mechanisms responsible for proximity effect reduction are also discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 636: Symposium D – Nonlithographic and Lithographic Methods of Nanofabrication-From Ultralarge Scale , 2000 , D6.5.1
Copyright
Copyright © Materials Research Society 2001

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