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Growth Promotion and Etching of Carbon Nanotubes by Carbon Dioxide in Chemical Vapor Deposition using Methane Gas

Published online by Cambridge University Press:  01 February 2011

Yoshiyuki Suda ,
Junichi Takayama ,
Takeshi Saito ,
Atsushi Okita ,
Junji Nakamura ,
Yosuke Sakai  and
Hirotake Sugawara
Yoshiyuki Suda
Affiliation:
[email protected], Hokkaido University, Graduate School of Information Science and Technology, North 14, West 9, Sapporo, 060-0814, Japan, +81-11-706-6482, +81-11-706-7890
Junichi Takayama
Affiliation:
[email protected], Hokkaido University, Sapporo, 060-0814, Japan
Takeshi Saito
Affiliation:
[email protected], Hokkaido University, Sapporo, 060-0814, Japan
Atsushi Okita
Affiliation:
[email protected], Hokkaido University, Sapporo, 060-0814, Japan
Junji Nakamura
Affiliation:
[email protected], University of Tsukuba, Tsukuba, 305-8573, Japan
Yosuke Sakai
Affiliation:
[email protected], Hokkaido University, Sapporo, 060-0814, Japan
Hirotake Sugawara
Affiliation:
[email protected], Hokkaido University, Sapporo, 060-0814, Japan
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Abstract

We report the effect of CO2 addition to CO4 gas on carbon nanotube (CNT) growth by chemical vapor deposition. CO2 gas was introduced during the growth of CNTs on Fe0.05Mo0.025MgO0.925 and Ni0.05Mo0.025MgO0.925 catalysts by CO4 gas at a temperature of 800–850°C, and its concentration in a fraction of the gas flow rate was varied from 5×10−3 to 50%. In the experimental condition of the preferential growth of multi-walled CNTs, the carbon yield and the G/D ratio in the Raman spectra of the CNTs grown in 10%-CO2/CO4 were slightly higher than that grown in CO4 only. However, CNTs hardly grew when the CO2 concentration was more than 10%. We then prepared CO2 gas diluted with Ar gas (CO2/Ar) and varied its flow rate between 0 and 10 sccm. As the CO2/Ar gas flow rate was increased, the number of RBM peaks decreased even though the G/D ratio gradually decreased. The decrease in the RBM intensities of CNTs on the FeMoMgO catalyst was more significant than that of NiMoMgO.

Keywords

chemical vapor deposition (CVD) (chemical reaction)nanostructureoxidation
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1057: Symposium II – Nanotubes and Related Nanostructures , 2007 , 1057-II05-15
Copyright
Copyright © Materials Research Society 2008

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References

REFERENCES

1. Colomer, J.-F., Stephan, C., Lefrant, S., Tendeloo, G.V., Willems, I., Konya, Z., Fonseca, A., Laurent, Ch., Nagy, J.B., Chem. Phys. Lett., 317 (2000) 83–89 Google Scholar
2. Maruyama, S., Kojima, R., Miyauchi, Y., Chiashi, S., Kohno, M., Chem. Phys. Lett., 360 (2002) 229–234 Google Scholar
3. Hata, K., Futaba, D.N., Mizuno, K., Namai, T., Yumura, M., Iijima, S., Science, 306 (2004) 1362–1364 Google Scholar
4. Nasibulin, A.G., Brown, D.P., Queipo, P., Gonzalez, D., Jiang, H., Kauppinen, E.I., Chem. Phys. Lett., 417 (2006) 179–184 Google Scholar
5. Wen, Q., Qian, W., Wei, F., Liu, Y., Ning, G., Zhang, Q., Chem. Mater., 19 (2007) 1226–1230 Google Scholar
6. Zhang, G., Mann, D., Zhang, L., Javey, A., Li, Y., Yenilmez, E., Wang, Q., McVittie, J.P., Nishi, Y., Gibbons, J., Dai, H., Proc. Natl. Acad. Sci., 102 (2005) 16141–16145 Google Scholar
7. Huang, H., Maruyama, R., Noda, K., Kajiura, H., Kadono, K., J. Phys. Chem. B, 110 (2006) 7316–7320 Google Scholar
8. Yang, C.-M., An, K.H., Park, J.S., Park, K.A., Lim, S.C., S.-H. Cho, Lee, Y.S., Park, W., Park, C.Y., Lee, Y.H., Phys. Rev. B, 73 (2006) 075419 Google Scholar
9. Delpeux, S., Szostak, K., Frackowiak, E., Beguin, F., Chem. Phys. Lett., 404 (2005) 374–378 Google Scholar
10. Zhou, L.-P., Ohta, K., Kuroda, K., Lei, N., Matsuishi, K., Gao, L., Matsumoto, T., Nakamura, J., J. Phys. Chem. B, 109 (2005) 4439–4447 Google Scholar