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Growth of Ge1−xCx, Alloys on Si by Combined Low-Energy Ion Beam and Molecular Beam Epitaxy Method
Published online by Cambridge University Press: 15 February 2011
Abstract
A combined ion beam and molecular beam epitaxy (CIBMBE) method was applied for the deposition of a Ge1−x, Cx, alloy on Si(100) using a low-energy ( 50 – 100 eV ) C+ ion beam and a Ge molecular beam. Metastable Ge1−xCx solid solutions were formed up to x= 0.047, and the CIBMBE method was shown to have a very high potential to grow metastable Ge1−xCx alloys. It was also revealed that the sticking coefficient of C+ ions into Ge was ˜28% for Ei = 100 eV and ˜18% for Ei. = 50 eV. Structural characterization suggests that the deposited films are single crystals grown epitaxially on the substrate with twins on {111} planes. Characterization of lattice dynamics using Raman spectroscopy suggested that the deposited layers have a small amount of ion irradiation damage.
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- Copyright © Materials Research Society 1997