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Growth of AlN bulk crystals from the vapor phase
Published online by Cambridge University Press: 21 March 2011
Abstract
AlN single crystals were grown by two different vapor phase processes: by vaporization of metallic Al in a nitrogen atmosphere, or by sublimation of an AlN source. Growth experiments were carried out under quasi-stagnant flow conditions, with typical flow rates of 100 sccm at reactor pressures ranging from 300 to 700 Torr. Growth temperatures ranged from 1800 to 2300°C. In Al vaporization experiments, the crystal shape and fastest growth direction was found to strongly depend on the growth temperature: at relatively low temperatures (1800-1900°C) long needles were grown, temperatures around 1900-2000°C yielded twinned platelets, while c-platelets were formed at temperatures above 2100°C. These c-plates grew at a rate of 5 mm/hr in the c-plane. When using AlN as a source material, growth rates were considerably slower, however, long-term stability of the Al flux was greatly improved. Seeded growth was demonstrated under these conditions. All grown single crystals were transparent and virtually colorless. Analytical results indicated very high crystalline quality and dislocation densities lower than 104cm-3.
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