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Growth Kinetics and Structure of Ultrathin Copper Films on the W(110) Surface Studied by Leem

Published online by Cambridge University Press:  21 February 2011

M.S. Altman
Affiliation:
Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong
E.Z. Luo
Affiliation:
Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong
W.F. Chung
Affiliation:
Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong
B.G. Orr
Affiliation:
Department of Physics, University of Michigan, Ann Arbor, Michigan, U.S.A.
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Abstract

Competing desorption during the epitaxial growth of Cu on the W(110) surface has been studied with low energy electron microscopy (LEEM). Direct imaging of a structural transformation from pseudomorphic (1×1) to relaxed (15×1) periodicity which occurs at a coverage of θCu = 2.13 monolayers is used as a very accurate, local probe of coverage during deposition. The desorption energy E = 3.67 eV and attempt frequency v = 2.15 × 1015 s−1 are determined by examining the balance condition when the incident and desorption fluxes are equal. A step-flow-like growth morphology occurs when the supersaturation is significantly reduced by competing desorption. An island nucleation and coalescence growth morphology results at higher supersaturation.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

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