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Growth and Properties of Ceramic thin Films Processed by In-Situ Laser Deposition Technique

Published online by Cambridge University Press:  26 February 2011

S. M. Kanetkar ,
S. Sharan ,
P. Tiwari ,
J. Matera  and
J. Narayan
S. M. Kanetkar
Affiliation:
On leave from Department of Physics, University of Poona, Pune-411007, INDIA.
S. Sharan
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC-27695-7916
P. Tiwari
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC-27695-7916
J. Matera
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC-27695-7916
J. Narayan
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC-27695-7916
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Abstract

Good quality ceramic thin films of yttria-stabilized zirconia (YSZ), MgO, BN and TiN were grown on single crystal silicon with (100) orientation using in-situ pulsed laser physical vapor deposition (LPVD) technique.Laser deposition parameters were optimized and the resulting thin films were characterized by X-ray diffraction ,Rutherford backscattering spectrometry and transmission electron microscopy (plan and cross section). All the films were found to be polycrystalline with a texture. The absence of interfacial reaction and smooth interface on the atomic scale are the main features observed in these oxides and nitrides thin films on Si (100) substrate.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 201: Symposium A – Surface Chemistry and Beam-Solid Interactions , 1990 , 189
Copyright
Copyright © Materials Research Society 1991

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