Hostname: page-component-586b7cd67f-t8hqh Total loading time: 0 Render date: 2024-11-29T09:46:39.407Z Has data issue: false hasContentIssue false

The Growth and Optimization of InPSb/InGaAs/InAsSb Strained-Layer Superlattice Emitters by Metal Organic Chemical Vapor Deposition

Published online by Cambridge University Press:  15 February 2011

R. M. Biefeld
Affiliation:
Sandia National Laboratory, Albuquerque, NM 87185-0601, USA
S. R. Kurtz
Affiliation:
Sandia National Laboratory, Albuquerque, NM 87185-0601, USA
Get access

Abstract

We have prepared InAsSb/InGaAs strained-layer superlattices (SLS's) and InPSb confinement layers using metal-organic chemical vapor deposition (MOCVD) for use as infrared emitters. X-ray diffraction was used to determine lattice matching as well as composition and structure of the SLS's. Photoluminescence linewidth and intensity were used as a measure of the quality of the structures. Typical FWHM were less than 10 meV. The presence of interface layers were indicated by broadened x-ray diffraction peaks for samples grown under non-optimized conditions. Two types of interfacial layers apparently due to a difference in composition at the interfaces were observed with transmission electron microscopy (TEM). The width of the x-ray peaks can be explained by a variation of the interfacial layer thicknesses. Optimized growth resulted in SLS's with narrow x-ray peaks and high radiative efficiency. Room temperature LEDs operating between 4-5 μm have been prepared.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Kurtz, S. R., Biefeld, R. M., Dawson, L. R., Baucom, K. C., and Howard, A. J., Appl. Phys. Lett. 64, 812 (1994).Google Scholar
[2] Biefeld, R. M., J. Crystal Growth 75, 255 (1986).Google Scholar
[3] Biefeld, R. M., Kurtz, S. R. and Casalnuovo, S. A., J. Crystal Growth 124 401 (1992).Google Scholar
[4] Biefeld, R. M., Baucom, K. C., Kurtz, S. R. and Follstaedt D, M 1994 Mat. Res. Soc. Symp. Proc., 325, 493 (1994).Google Scholar
[5] Kurtz, S. R., Biefeld, R. M., and Dawson, L. R., Phys. Rev. B, 51, 7310 (1995).Google Scholar
[6] Biefeld, R. M., Hills, C. R., and Lee, S. J. Crystal Growth 91, 515 (1988).Google Scholar
[7] Kurtz, S. R. and Biefeld, R. M., Phys. Rev. B 44, 1143 (1991).Google Scholar
[8] Follstaedt, D. M., Biefeld, R. M., Kurtz, S. R. and Baucom, K. C., submitted to J. Electronic Materials.Google Scholar
[9] Chow, D. H., Miles, R. H., Soderstrom, J. R., and McGill, T. C., J. Vac. Sci. Technol. B 8 710 (1990).Google Scholar
[10] Feenstra, R. M., Collins, D. A., Ting, D. Z-Y., Wang, M. W., and McGill, T. C., J. Vac. Sci. Technol. B 12 2592 (1994).Google Scholar
[11] Wei, S-H. and Zunger, A., Appl. Phys. Lett. 58, 2684 (1991).Google Scholar