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A General Approach to Patterning Micron-Scale Particles

Published online by Cambridge University Press:  01 February 2011

Nathanael Sieb  and
Byron D. Gates
Nathanael Sieb
Affiliation:
[email protected], Simon Fraser University, Department of Chemistry, 8888 University Drive, Burnaby, V5A1S6, Canada
Byron D. Gates
Affiliation:
[email protected], Simon Fraser University, Department of Chemistry, 8888 University Drive, Burnaby, V5A1S6, Canada
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Abstract

Multiple techniques have been developed to assemble micro- or nanostructured materials into well-defined patterns. These techniques are, however, often dependent on the size, shape, composition and/or surface chemistry of the structures being patterned. We have developed a general approach to pattern materials with a wide range of physical and chemical characteristics. We are able to assemble these materials into isolated or interconnected patterns covering areas up to ∼1 mm2.

Keywords

self-assemblymicrostructurecolloid
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 947: Symposium A – Responsive Soft Matter – Chemistry and Physics for Assemblages, Films and Forms , 2006 , 0947-03-24
Copyright
Copyright © Materials Research Society 2007

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References

REFERENCES

1. Bowden, N., Choi, I. S., Grzybowski, B. A., Whitesides, G. M., J. Am. Chem. Soc. 121, 5373 (1999)Google Scholar
2. Duan, H., Wang, D., Kurth, D. G., Möhwald, H., Angew. Chem. 43, 5649 (2004)Google Scholar
3. Liu, Y., Wang, S., Lee, J. W., Kotov, N. A., Chem. Mater. 17, 4918 (2005)Google Scholar
4. Li, Y. J., Huang, W. J., Sun, S. G., Angew. Chem. 45, 2537 (2006)Google Scholar
5. Lazarov, G. S., Denkov, N. D., Velev, O. D., Kralchevsky, P. A., J. Chem. Soc. Faraday Trans. 90, 2077 (1994)Google Scholar
6. Huck, W. T. S., Tien, J., Whitesides, G. M., J. Am. Chem. Soc. 120, 8267 (1998)Google Scholar
7. Velev, O. D., Lenhoff, A. M., Kaler, E. W., Science 287, 2240 (2000)Google Scholar
8. Yin, Y., Lu, Y., Gates, B., Xia, Y., J. Am. Chem. Soc. 123, 8718 (2001)Google Scholar
9. Varghese, B., Cheong, F. C., Sindhu, S., Yu, T., Lim, C. T., Valiyaveettil, S. and Sow, C. H., Langmuir 22, 8248 (2006)Google Scholar
10. Yan, X., Yao, J., Lu, G., Chen, X., Zhang, K., Yang, B., J. Am. Chem. Soc. 126, 10510 (2004)Google Scholar
11. Santhanam, V., Andres, R. P., Nano Lett. 4, 41 (2004)Google Scholar
12. Ding, L., Zhou, W., Chu, H., Jin, Z., Zhang, Y., Li, Y., Chem. Mater. 18, 4109 (2006)Google Scholar
13. Gates, B. D., Xu, Q., Stewart, M., Ryan, D., Willson, C. G., Whitesides, G. M., Chem. Rev. 105, 1171 (2005)Google Scholar
14. Mark, J. E., Physical Properties of Polymers Handbook, (AIP Press, New York, 1996) p. 156 Google Scholar