Hostname: page-component-586b7cd67f-rcrh6 Total loading time: 0 Render date: 2024-11-25T17:51:25.909Z Has data issue: false hasContentIssue false
  • English
  • Français

Gas Phase and Surface Kinetics of Diamond-Like Carbon Films Growth in Pecvd Reactors

Published online by Cambridge University Press:  10 February 2011

Maurizio Masi ,
Carlo Cavallotti  and
Sergio Carrà
Maurizio Masi
Affiliation:
Dipartimento di Chimica Fisica Applicata, Politeonico di Milano, Piazza Leonardo da Vinci 32, 20133 Milano ITALY, [email protected]
Carlo Cavallotti
Affiliation:
Dipartimento di Chimica Fisica Applicata, Politeonico di Milano, Piazza Leonardo da Vinci 32, 20133 Milano ITALY, [email protected]
Sergio Carrà
Affiliation:
Dipartimento di Chimica Fisica Applicata, Politeonico di Milano, Piazza Leonardo da Vinci 32, 20133 Milano ITALY, [email protected]
Get access

Abstract

The surface and gas-phase kinetic of deposition of diamond-like carbon films (DLC) obtained in plasma reactors using methane as precursor was here investigated. Kinetic constants of electronic reactions were evaluated using experimental ionization and neutral dissociation cross sections and the Druyvestein electron distribution function. Kinetic constants for ionic and neutral reactions were found in the literature. Surface reactions were divided into processes involving the impingement of gas-phase radicals or ions from the plasma and desorption or recombination reactions of adsorbed surface species. The kinetic constants of the former processes were evaluated.from the ambipolar theory or from the kinetic theory of gases, while the other kinetic constants were determined from analogy with hydrocarbon chemistry. The exception is the desorption of adsorbed methyl radicals, whose kinetic constant was fitted over experimental data. The predictivity of the model was tested through the simulation of three reactors described in the literature widely differing for operating conditions.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 555: Symposium OO – Properties and Processing of Vapor-Deposited Coatings , 1998 , 321
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Angus, J.C. and Hayman, C.C., Science 241, p. 913 (1988).Google Scholar
2. Robertson, J., Surf. Coat. Technol. 50, p. 185 (1992).Google Scholar
3. Masi, M., Besana, G., Canzi, L. and Carrá, S., Chem. Engng. Sci. 49, p. 669 (1994).Google Scholar
4. Masi, M., Cavallotti, C. and Carr, S.;, Chem. Engng. Sci., 53, p. 2271 (1998).Google Scholar
5. Chatam, H., Hills, D., robertson, R. and Gallagher, A., J. Chem. Phys. 81, p. 1770 (1984).Google Scholar
6. Winters, H.F., J. Chem. Phys. 63, p. 3462 (1975).Google Scholar
7. Golant, V.E., Zilinskij, A.P. and Sacharov, S.E., Osnovi Fiziki Plasmy, Mir, Moscow, 1983.Google Scholar
8. Angus, J.C. and Jansen, F., J. Vac. Sci. Technol. A6, p. 1778 (1988).Google Scholar
9. Harris, S.J. and Goodwin, D.G., J. Phys. Chem. 97, p. 23 (1993).Google Scholar
10. von Keudell, A. and Möller, W., J. Appl. Phys. 75, p. 7718 (1994).Google Scholar
11. Kline, L.E., Partlow, W.D. and Bies, W.E.., J. Appi. Phys. 65, p. 70 (1989).Google Scholar
12. Vandentop, G.J., Kawasaki, M., Nix, R.M., Brown, I.G., Salmeron, M. and Somorjai, G.A., Phys. Rev. B 41, p. 3200 (1990).Google Scholar
13. Smolinsky, G. and Vasile, M.J., J. Macromol. Sci.-Chem. A 10,p. 473 (1976).Google Scholar
14. Tachibana, K., Nishida, M., Harima, H. and Urano, Y., J. Phys. D 17, p. 1727 (1984).Google Scholar