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The Gas Field Ion Source for Finely Focused Ion Beam Systems

Published online by Cambridge University Press:  21 February 2011

W. Thompson ,
A. Armstrong ,
S. Etchin ,
R. Percival  and
A. Saxonis
W. Thompson
Affiliation:
Micrion Corporation, One Corporation Way, Peabody, MA 01960, [email protected]
A. Armstrong
Affiliation:
Micrion Corporation, One Corporation Way, Peabody, MA 01960, [email protected]
S. Etchin
Affiliation:
Micrion Corporation, One Corporation Way, Peabody, MA 01960, [email protected]
R. Percival
Affiliation:
Micrion Corporation, One Corporation Way, Peabody, MA 01960, [email protected]
A. Saxonis
Affiliation:
Micrion Corporation, One Corporation Way, Peabody, MA 01960, [email protected]
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Abstract

The Gas Field Ion Source, GFIS, promises a 109A/(cm2 str) brightness, small beam sizes, and inert gas ion species. If this performance could be demonstrated on a commercial system, the GFIS might replace the liquid metal ion source as the standard source for FIB applications. Recent work at the Max-Planck-Institut für Kernphysik (MPI-K) in Heidelberg, Germany has shown that a GFIS with a ‘Super Tipped’ emitter can be reliably fabricated and can be run with stable helium beam current for more than 200 hours. However, this GFIS source must operate in a bakable UHV chamber, at cryogenic temperatures, and at high voltages with low vibration. A GFIS is now being integrated with high resolution ion optics and a vacuum chamber designed for studying GFIS image quality and ion induced chemistry.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 396: Symposium A – Ion-Solid Interactions for Materials Modification and Processing , 1995 , 687
Copyright
Copyright © Materials Research Society 1996

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References

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