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Functional Behaviour of Thin Film Dielectric Superlattices

Published online by Cambridge University Press:  17 March 2011

J. M. Gregg
Affiliation:
Department of Pure and Applied Physics The Queen's University of Belfast Belfast BT7 1NN, U. K
M. H. Corbett
Affiliation:
Department of Pure and Applied Physics The Queen's University of Belfast Belfast BT7 1NN, U. K
D. O'Neill
Affiliation:
Department of Pure and Applied Physics The Queen's University of Belfast Belfast BT7 1NN, U. K
G. Catalan
Affiliation:
Department of Pure and Applied Physics The Queen's University of Belfast Belfast BT7 1NN, U. K
R. M. Bowman
Affiliation:
Department of Pure and Applied Physics The Queen's University of Belfast Belfast BT7 1NN, U. K
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Abstract

Pulsed laser deposition has been used to fabricate thin-film capacitor structures in which the dielectric layer is a superlattice. The properties of two superlattice systems were investigated as a function of superlattice wavelength (δ) – one based on barium strontium titanate and the other on lead-based relaxor electroceramics. In both systems the dielectric constant was significantly enhanced at stacking wavelengths of a few unit cells. However, the dielectric enhancement seen in the barium strontium titanate superlattices was found to be due to Maxwell-Wagner effects, whereas in the relaxor superlattices Maxwell-Wagner behaviour was not evident; rather, the dielectric enhancement was associated with the onset of polar coupling aroundδ ∼ 10nm.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

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References

1. Erbil, A., Kim, Y. and Gerhart, R. A., Phys. Rev. Lett. 77, 1628 (1996)Google Scholar
2. Tian, W., Haeni, J. H., Schlom, D. G. and Pan, X. Q., Ferroelectric Thin Films IX, 543, Proceedings of the Materials Research Society Conference, Fall 2000 Google Scholar
3. Specht, E. D., Christen, H.-M., Norton, D. P. and Boatner, L. A., Phys. Rev. Lett. 80, 4317 (1998)Google Scholar
4. Tabata, H., Tanaka, H. and Kawai, T., Appl. Phys. Lett. 65, 1970 (1994)Google Scholar
5. Hippel, A. R. von, Dielectrics and Waves (Artech House, London, 1995)Google Scholar
6. Viehland, D., Yang, S. J., Cross, L. E. and Wuttig, M., J. Appl. Phys. 68, 2916 (1990)Google Scholar