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A Fresh Insight into Film Morphology Measurement Techniques for Advanced Ulsi Manufacturing

Published online by Cambridge University Press:  21 February 2011

Seshadri Ramaswami*
Affiliation:
Advanced Micro Devices, Integrated Technology Division, Sunnyvale, CA 94088
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Abstract

A laser based non-destructive technique has been used to study the morphology of sputterdeposited aluminum alloy films. The data emanating from the Therma-wave Imager that makes use of this principle, has been correlated with reflectivity, grain size and micro-roughness of the film. In addition, through the use of a case study, this paper demonstrates the utility of this application as an in-line monitor in an integrated circuit fabrication line.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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References

1. Smith, W.L. et al. , Semiconductor International, Jan 1990.Google Scholar
2. Smith, W.L. et al. , Technical Proceedings, Semicon/Osaka, 1989.Google Scholar