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A Fractal Study of Silcon Surfaces

Published online by Cambridge University Press:  21 February 2011

L. Spanos  and
E.E. Irene
L. Spanos
Affiliation:
The University of North Carolina at Chapel Hill, Department of Chemistry, Chapel Hill, NC 27599-3290
E.E. Irene
Affiliation:
The University of North Carolina at Chapel Hill, Department of Chemistry, Chapel Hill, NC 27599-3290
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Abstract

In this work the variation method is used to extract the fractal dimension of rough surfaces. Rough silicon surfaces from chemical etching and rapid thermal deposition were measured with atomic force microscopy and are shown to exhibit fractal properties.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 315: Symposium Y – Surface Chemical Cleaning and Passivation for Semiconductor Processing , 1993 , 411
Copyright
Copyright © Materials Research Society 1993

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References

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