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Formation of Metallic Systems Far From Equilibrium By Pulsed Laser Deposition

Published online by Cambridge University Press:  10 February 2011

Hans-Ulrich Krebs ,
Marco Hamp ,
Sebastian Fähler ,
Michael Störmer ,
Kai Sturm  and
Martin Weisheit
Hans-Ulrich Krebs
Affiliation:
Institut für Metallphysik, University of Göttingen, Hospitalstrasse 3-7, 37073 Göttingen and Sonderforschungsbereich 345, Germany, [email protected]
Marco Hamp
Affiliation:
Institut für Metallphysik, University of Göttingen, Hospitalstrasse 3-7, 37073 Göttingen and Sonderforschungsbereich 345, Germany, [email protected]
Sebastian Fähler
Affiliation:
Institut für Metallphysik, University of Göttingen, Hospitalstrasse 3-7, 37073 Göttingen and Sonderforschungsbereich 345, Germany, [email protected]
Michael Störmer
Affiliation:
Institut für Metallphysik, University of Göttingen, Hospitalstrasse 3-7, 37073 Göttingen and Sonderforschungsbereich 345, Germany, [email protected]
Kai Sturm
Affiliation:
Institut für Metallphysik, University of Göttingen, Hospitalstrasse 3-7, 37073 Göttingen and Sonderforschungsbereich 345, Germany, [email protected]
Martin Weisheit
Affiliation:
Institut für Metallphysik, University of Göttingen, Hospitalstrasse 3-7, 37073 Göttingen and Sonderforschungsbereich 345, Germany, [email protected]
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Abstract

The properties of metallic thin films prepared by pulsed laser deposition (PLD) strongly differ from samples grown by conventional thin film techniques like sputtering and evaporation. In many systems (Fe-Nb, Fe-Zr, Cu-Co, Fe-Ag and Ni-Ag), strongly supersaturated solid solutions are formed, a broader formation range occurring for amorphous samples, and nanocrystalline phases are produced. Additionally, metastable phases of larger thickness at the interfaces of multilayers occur. Reasons for these behaviors are discussed with respect to atomic mixing and implantation effects induced by the high instantaneous deposition rate during PLD and the high kinetic energy (>100 eV) of the deposited ions.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 481: Symposium P – Science and Technology of Semiconductor Surface Preparation , 1997 , 575
Copyright
Copyright © Materials Research Society 1998

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References

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