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Formation of Buried Oxynitride Layer into Silica Glass using Ion Beam

Published online by Cambridge University Press:  25 February 2011

Keiji Oyoshi ,
Takashi Tagami  and
Shuhei Tanaka
Keiji Oyoshi
Affiliation:
Tsukuba Research Laboratory, Nippon Sheet Glass Co., Ltd., 5-4 Tokodai, Tsukuba City, Ibaraki, 300-26 Japan
Takashi Tagami
Affiliation:
Tsukuba Research Laboratory, Nippon Sheet Glass Co., Ltd., 5-4 Tokodai, Tsukuba City, Ibaraki, 300-26 Japan
Shuhei Tanaka
Affiliation:
Tsukuba Research Laboratory, Nippon Sheet Glass Co., Ltd., 5-4 Tokodai, Tsukuba City, Ibaraki, 300-26 Japan
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Abstract

Both silicon and nitrogen implanted silica glasses were characterized by SIMS, XPS and SEM. Bubbles appeared in the implanted region at the high dose implantation (the silicon to nitrogen dose ratio is 0.75 and the total dose is 4×10 ions/cm2). Suppression methods of bubble formation were discussed concerning about the nitrogen implantation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 157: Symposium A – Beam-Solid Interactions: Physical Phenomena , 1989 , 149
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

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