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Flashlamp-Pumped Dye and Excimer Laser Planarization of Thin Metal Films

Published online by Cambridge University Press:  25 February 2011

Paul F. Marella
Affiliation:
Stanford Solid-State Electronics Laboratory, Stanford University, Stanford, CA 94305
David B. Tuckerman
Affiliation:
LP Program, Special Studies Division, Lawrence Livermore National Laboratory, Livermore, CA 94550
R. Fabian Pease
Affiliation:
Stanford Solid-State Electronics Laboratory, Stanford University, Stanford, CA 94305
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Abstract

The fundamental differences between excimer (≈ 30 ns pulse duration) and flashlamp-pumped dye (≈ 500 ns pulse duration) laser planarization are examined for 1.5-2 µm thick gold films over SiO2 layers. Test structures containing bar patterns (square waves) of 5000 Å peak-to-trough amplitude with spatial periods ranging from 10 µm to 100 µm were prepared and laser-irradiated. A linear model is presented which describes the time-evolution of the film's surface topography when melted with a dye laser pulse. Excimer laser planarization is found to be susceptible to evaporative recoil effects which may cause undesired pattern amplification.

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

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References

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