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Fabrication of Two Dimensional Array of Silica Nanospheres on GaN Using Spin Coating Method and Nomarski Image Processing

Published online by Cambridge University Press:  31 January 2011

Kyoungnae Lee
Affiliation:
[email protected], West Virginia University, Lane Department of Computer Science and Electrical Engineering, Morgantown, West Virginia, United States
hyma yalamanchili
Affiliation:
[email protected], West Virginia University, Lane Department of Computer Science and Electrical Engineering, Morgantown, West Virginia, United States
J. M. Dawson
Affiliation:
[email protected], United States
D Korakakis
Affiliation:
[email protected], West Virginia University, Lane Department of Computer Science and Electrical Engineering, Morgantown, West Virginia, United States
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Abstract

Large-scale two dimensional ordering of silica nanospheres on GaN substrates was fabricated using spin-coating and observed using Matlab-based Nomarski image processing, which was developed to calculate the surface coverage of 2D and 3D ordering of silica nanospheres on GaN substrates. Optimal spin coating condition and SDS concentration were investigated with Nomarski image processing and an SEM. The details on spin coating process parameters or SDS concentration vs. surface coverage of silica nanospheres on GaN substrate are discussed, along with a theoretical exploration of the effects of nanosphere patterning on photonic crystals fabricated using this method.

Type
Research Article
Copyright
Copyright © Materials Research Society 2010

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