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Fabrication of Tin Loaded Resorcinol Formaldehyde Aerogel Spheres for Extreme Ultraviolet Source Emission

Published online by Cambridge University Press:  01 February 2011

Reny R Paguio ,
Abbas Nikroo ,
Chris A Frederick ,
Jared F Hund  and
Mary Thi
Reny R Paguio
Affiliation:
[email protected], General Atomics, Inertial Fusion Technology, P.O. Box 85608, San Diego, CA, 92186-5608, United States, 858-455-3953
Abbas Nikroo
Affiliation:
[email protected], General Atomics, Inertial Fusion Technology, P.O. Box 85608, San Diego, CA, 92186-5608, United States
Chris A Frederick
Affiliation:
[email protected], General Atomics, Inertial Fusion Technology, P.O. Box 85608, San Diego, CA, 92186-5608, United States
Jared F Hund
Affiliation:
[email protected], General Atomics, Inertial Fusion Technology, P.O. Box 85608, San Diego, CA, 92186-5608, United States
Mary Thi
Affiliation:
[email protected], General Atomics, Inertial Fusion Technology, P.O. Box 85608, San Diego, CA, 92186-5608, United States
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Abstract

Low density Sn doped resorcinol formaldehyde aerogels were fabricated for extreme ultraviolet (EUV) source emission lithography experiments (EUVL). EUVL is a candidate to succeed conventional optical lithography. EUVL requires a reliable emission (13.5 nm) source. One type of source is a laser-produced plasma. Several laser-plasma source materials have been considered such as lithium, xenon and tin. Tin is considered ideal because it has a high conversion effeciency. However, solid tin targets create a large quantity of debris which can damage the optics of the laser system. As a solution to this problem, we minimized the amount of tin by dispersing it in a low density resorcinol formaldehyde (R/F) matrix. These targets were fabricated into small spheres using the microencapsulation method. Initial experimental results show that these targets yield a similar intensity in the EUV regime when compred to a full density Sn target.

Keywords

aerogelsol-gellithography (removal)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 961: Symposium O – Nanostructured and Patterned Materials for Information Storage , 2006 , 0961-O14-02
Copyright
Copyright © Materials Research Society 2007

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References

1. Harilal, S.S. et al., Optics Letters, 31(10), 1549 (2006).Google Scholar
2. Harilal, S.S. et al., Journal of Physics D: Applied Physics 39, 484, (2006).Google Scholar
3. Marx, B. et al., Laser Focus World, 39(4), 34, (2003).Google Scholar
4. Brandt, D.C. et al., Solid State Technology, May (2005).Google Scholar
5. Paguio, R.R. et al., IEEE/NPSS Symposium of Fusion Engineering, (2005).Google Scholar
6. Hund, J.F. et al., Fusion Sci. Technol. 49(4), 669, (2006).Google Scholar
7. Paguio, R.R. et al., Polymeric Materials: Science & Engineering 95, 872, (2006).Google Scholar
8. Lambert, S.M. et al., J. Appl. Polymer Sci. 65, 2111, (1997).Google Scholar
9. Nikroo, A., Czechowicz, D., Paguio, R., Greenwood, A.L., Takagi, M., Fusion Technol. 45, 84, (2004).Google Scholar
10. Paguio, R.R. et al., J. of Applied Polymer Science 101(4), 2523, (2006).Google Scholar
11. Pekala, R.W. et al., J. Mat. Sci. 24, 3221, (1989).Google Scholar