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The Fabrication of Semiconductor Nanostructure Arrays on a Silicon Substrate Using an Anodized Aluminum Template

Published online by Cambridge University Press:  15 February 2011

S. P. McGinnis ,
J. N. Cleary  and
B. Das
S. P. McGinnis
Affiliation:
Department of Electrical and Computer Engineering, West Virginia University, P.O. Box 6104, Morgantown, WV 26506
J. N. Cleary
Affiliation:
Department of Chemical Engineering, West Virginia University, P.O. Box 6104, Morgantown, WV 26506
B. Das
Affiliation:
Department of Electrical and Computer Engineering, West Virginia University, P.O. Box 6104, Morgantown, WV 26506
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Abstract

We have developed a nanogrowth technology for the fabrication of periodic arrays of semiconductor nanostructures on silicon that is currently being investigated for silicon based x-ray detectors. The semiconductor nanostructures are formed by chemical synthesis in pores of a template created by the anodization of aluminum on a silicon substrate. The use of the silicon substrate allows greater control over the aluminum thin film properties, better in situ monitoring of the pore formation process, and the direct integration of nanostructure arrays with conventional silicon technology.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 452 , 1996 , 299
Copyright
Copyright © Materials Research Society 1997

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